- List
- EU dual-use list – Annex I to Regulation (EU) 2021/821, updated annually
Entries in this group
- 3A Systems, equipment and components
- 3A001 Electronic items as follows:
- 3A002 General purpose "electronic assemblies", modules and equipment, as follows:
- 3A003 Spray cooling thermal management systems employing closed loop fluid handling and reconditioning equipment in a sealed enclosure where a dielectric fluid is…
- 3A101 Electronic equipment, devices and components, other than those specified in 3A001, as follows:
- 3A102 'Thermal batteries' designed or modified for 'missiles'.
- 3A201 Electronic components, other than those specified in 3A001, as follows;
- 3A225 Frequency changers or generators, other than those specified in 0B001.b.13., usable as a variable or fixed frequency motor drive, having all of the following…
- 3A226 High-power direct current power supplies, other than those specified in 0B001.j.6., having both of the following characteristics:
- 3A227 High-voltage direct current power supplies, other than those specified in 0B001.j.5., having both of the following characteristics:
- 3A228 Switching devices, as follows:
- 3A229 High-current pulse generators as follows:
- 3A230 High-speed pulse generators, and 'pulse heads' therefor, having both of the following characteristics:
- 3A231 Neutron generator systems, including tubes, having both of the following characteristics:
- 3A232 Multipoint initiation systems, other than those specified in 1A007, as follows:
- 3A233 Mass spectrometers, other than those specified in 0B002.g., capable of measuring ions of 230 u or greater and having a resolution of better than 2 parts in…
- 3A234 Striplines to provide low inductance path to detonators with the following characteristics:
- 3A501 Electronic items as follows:
- 3A502 General purpose "electronic assemblies", modules and equipment, as follows:
- 3A504 Cryogenic cooling systems and components, as follows:
- 3B Test, inspection and production equipment
- 3B001 Equipment for the manufacturing of semiconductor devices or materials, as follows and specially designed components and accessories therefor:
- 3B002 Test equipment specially designed for testing finished or unfinished semiconductor devices as follows and specially designed components and accessories…
- 3B501 Equipment for the manufacturing of semiconductor devices or materials, as follows and specially designed components and accessories therefor:
- 3B503 Scanning Electron Microscope (SEM) equipment designed for imaging semiconductor devices or integrated circuits, having all of the following:
- 3B504 Cryogenic wafer probing equipment, having all of the following:
- 3C Materials
- 3C001 Hetero-epitaxial materials, not specified in 3C507, consisting of a "substrate" having stacked epitaxially grown multiple layers of any of the following:
- 3C002 Resist materials as follows and "substrates" coated with the following resists:
- 3C003 Organo-inorganic compounds as follows:
- 3C004 Hydrides of phosphorus, arsenic or antimony, having a purity greater (better) than 99,999 %, even diluted in inert gases or hydrogen.
- 3C005 High resistivity materials as follows:
- 3C006 Materials, not specified in 3C001, consisting of a "substrate" specified in 3C005 with at least one epitaxial layer of silicon carbide (SiC), gallium nitride…
- 3C507 Epitaxial materials consisting of a "substrate" having at least one epitaxially grown layer of any of the following:
- 3C508 Fluorides, hydrides, or chlorides, of silicon or germanium, containing any of the following:
- 3C509 Silicon, silicon oxides, germanium or germanium oxides, containing any of the following:
- 3D Software
- 3D001 "Software" specially designed for the "development" or "production" of equipment specified in 3A001.b. to 3A002.h., 3A501.b.13. or 3B.
- 3D002 "Software" specially designed for the "use" of equipment specified in 3B001.a. to 3B001.f., 3B002, 3A225, 3B501.a.4., 3B501.f.1., 3B501.k. or 3B501.n.
- 3D003 'Computational lithography' "software" specially designed for the "development" of patterns on EUV-lithography masks or reticles.
- 3D004 "Software" specially designed for the "development" of equipment specified in 3A003.
- 3D005 "Software" specially designed to restore normal operation of a microcomputer, "microprocessor microcircuit" or "microcomputer microcircuit" within 1 ms after…
- 3D006 'Electronic Computer-Aided Design' ('ECAD') "software" specially designed for the "development" of integrated circuits having any "Gate-All-Around Field-Effect…
- 3D101 "Software" specially designed or modified for the "use" of equipment specified in 3A101.b.
- 3D225 "Software" specially designed to enhance or release the performance of frequency changers or generators to meet the characteristics of 3A225.
- 3D507 "Software" designed to extract 'GDSII' or equivalent standard layout data and perform layer-to-layer alignment from Scanning Electron Microscope (SEM) images…
- 3E Technology
- 3E001 "Technology" according to the General Technology Note for the "development" or "production" of equipment or materials specified in 3A, 3B or 3C.
- 3E002 "Technology" according to the General Technology Note, other than that specified in 3E001, for the "development" or "production" of a "microprocessor…
- 3E003 Other "technology" for the "development" or "production" of the following:
- 3E004 "Technology" "required" for the slicing, grinding and polishing of 300 mm diameter silicon wafers to achieve a 'Site Front least sQuares Range' ('SFQR') less…
- 3E101 "Technology" according to the General Technology Note for the "use" of equipment or "software" specified in 3A001.a.1. or 2., 3A101, 3A102 or 3D101.
- 3E102 "Technology" according to the General Technology Note for the "development" of "software" specified in 3D101.
- 3E201 "Technology" according to the General Technology Note for the "use" of equipment specified in 3A001.e.2., 3A001.e.3., 3A001.g., 3A201, 3A225 to 3A234.
- 3E225 "Technology", in the form of codes or keys, to enhance or release the performance of frequency changers or generators to meet the characteristics of 3A225.
- 3E505 "Technology" according to the General Technology Note for the "development" or "production" of integrated circuits or devices, using "Gate-All-Around…