Sunday, 1 November 2026
Standing Office 81 (SOVNPA 81) emblem Viet Nam NVietnam National Presiding Agency
on Countering the Proliferation of Weapons of Mass Destruction
Standing Office 81

3C507Epitaxial materials consisting of a "substrate" having at least one epitaxially grown layer of any of the following:

List
EU dual-use list – Annex I to Regulation (EU) 2021/821, updated annually
Originating regime
Quốc gia/EU
a. Silicon having an isotopic impurity less than 0,08 % of silicon isotopes other than silicon-28 or silicon-30; or
b. Germanium having an isotopic impurity less than 0,08 % of germanium isotopes other than germanium-70, germanium-72, germanium-74, or germanium-76.