Sunday, 1 November 2026
Standing Office 81 (SOVNPA 81) emblem Viet Nam NVietnam National Presiding Agency
on Countering the Proliferation of Weapons of Mass Destruction
Standing Office 81

3.D.3.'Computational lithography' "software" specially designed for the "development" of patterns on EUV-lithography masks or reticles.

List
Wassenaar Arrangement – List of Dual-Use Goods and Technologies – WA-LIST (25) 1
Corresponding EU entry
3D003
Technical Note
For the purposes of 3.D.3., 'computational lithography' is the use of computer modelling to predict, correct, optimise and verify imaging performance of the lithography process over a range of patterns, processes, and system conditions.