Sunday, 1 November 2026
Standing Office 81 (SOVNPA 81) emblem Viet Nam NVietnam National Presiding Agency
on Countering the Proliferation of Weapons of Mass Destruction
Standing Office 81

3.C.5.High resistivity materials as follows:

List
Wassenaar Arrangement – List of Dual-Use Goods and Technologies – WA-LIST (25) 1
Corresponding EU entry
3C005
a. Silicon carbide (SiC), gallium nitride (GaN), aluminium nitride (AlN), aluminium gallium nitride (AlGaN), gallium oxide (Ga₂O₃) or diamond semiconductor "substrates", or ingots, boules, or other preforms of those materials, having resistivities greater than 10,000 ohm-cm at 20°C;
b. Polycrystalline "substrates" or polycrystalline ceramic "substrates", having resistivities greater than 10,000 ohm-cm at 20°C and having at least one non-epitaxial single-crystal layer of silicon (Si), silicon carbide (SiC), gallium nitride (GaN), aluminium nitride (AlN), aluminium gallium nitride (AlGaN), gallium oxide (Ga₂O₃) or diamond on the surface of the "substrate".
N.B. For materials consisting of a "substrate" specified in 3.C.5. with at least one epitaxial layer, see 3.C.1. or 3.C.6.